Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our site without changing the browser settings you grant us permission to store that information on your device.
V. RAKHESH1,* , V. K. VAIDYAN1
Zinc oxide (ZnO) in its film form is an n-type semiconductor and has gained much interest in research community because of better optical properties such as uv-visible luminescence. It is a known fact that the intrinsic and extrinsic defects in ZnO control the optical and electrical properties. The ZnO films were deposited on glass substrates by sputtering using vacuum arc produced from pure metal plate of zinc (99.9%) in oxygen (O2) and nitrogen (N2) atmosphere. The XRD analysis revealed the role of oxygen ambience in crystallanity of the films. Photoluminescence (PL) measurement suggested that there is no chance of sharp reemission from both films. Transmission and sheet resistance studies infer that ZnO films deposited in oxygen ambience is a better candidate for transparent conducting electrodes. The optical band gaps were determined and found to be equal to 3.47 and 3.35 eV for films deposited in O2 and N2 atmosphere, respectively.
ZnO, DC sputtering, Photoluminescence, Sheet resistance.
V. RAKHESH, V. K. VAIDYAN, The electrical and optical properties of zinc oxide films deposited by DC sputtering, Optoelectronics and Advanced Materials - Rapid Communications, 4, 9, September 2010, pp.1321-1323 (2010).
Submitted at: May 17, 2010
Accepted at: Sept. 15, 2010
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
Active accounts were imported to the new platform and assigned a random password by default. In order to access your account you need to access the login page and go through the Lost Password dialog (involves the system sending you an email with instructions) in order to reset your password. This step is necessary as passwords are kept in hashed form and the new platform uses modern hashing algorithms incompatible with the previous ones.