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The effect of doping concentration on VCSEL performance

F. Z. JASIM1, K. OMAR1,* , Z. HASSAN1

Affiliation

  1. Nano. Optoelectronic Research and Technology Laboratory, School of Physic, Universiti Sains Malaysia 11800 Penang, Malaysia

Abstract

The performance of 850 nm GaAs multiple quantum well (MQWs) vertical cavity surface emitting laser (VCSEL) laser structure has been numerically investigated by using laser technology-integrated program ISETCAD simulation. The effect of the doping concentration on the VCSEL output performance has been investigated. The maximum output power and lower threshold current was observed when both distributed Bragg reflector DBR and spacer layers are doped with high level doping concentration. In addition, it was observed that doping can strongly affect the slope efficiency of the VCSEL.

Keywords

GaAs, 850 nm, VCSEL.

Citation

F. Z. JASIM, K. OMAR, Z. HASSAN, The effect of doping concentration on VCSEL performance, Optoelectronics and Advanced Materials - Rapid Communications, 3, 1, January 2009, pp.10-12 (2009).

Submitted at: Nov. 12, 2008

Accepted at: Jan. 21, 2009