"

Cookies ussage consent

Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our site without changing the browser settings you grant us permission to store that information on your device.

Temperature dependent Rolletti stability analysis of GaN HEMT

R. YILDIRIM1, H. GÜÇLÜ YAVUZCAN1, F. V. ÇELEBI2,* , L. GOKREM3

Affiliation

  1. Gazi Üniversitesi, Endüstriyel Sanatlar Eğt. Fak Gölbaşı-Ankara, Turkey
  2. Ankara Üniversitesi, Bilgisayar Müh. Böl., Beşevler-Ankara, Turkey
  3. Gaziosmanpaşa Üniversitesi, Meslek Yüksek Okulu- Tokat, Turkey

Abstract

In this study, Rolletti stability criterion (K) analysis is performed based on the scattering parameters of GaN based High Electron Mobility Transistor (HEMT). The change in K and D (Delta, D) with temperature is analyzed and the relationship between K andD is determined. The frequency region where the effective temperature change is determined by indicating the critical points for the stability of HEMT. In addition to that, best values of K andD are specified along with the boundary values and the region where HEMT works stable is determined.

Keywords

HEMT, Stability, Rolletti, Temperature, GaN HEMT.

Citation

R. YILDIRIM, H. GÜÇLÜ YAVUZCAN, F. V. ÇELEBI, L. GOKREM, Temperature dependent Rolletti stability analysis of GaN HEMT, Optoelectronics and Advanced Materials - Rapid Communications, 3, 8, August 2009, pp.781-786 (2009).

Submitted at: March 12, 2009

Accepted at: July 31, 2009