Abstract
        The Au/n-GaN Schottky barrier diode (SBDs) has been characterized by current-voltage (I-V), capacitance-voltage (C-V) 
and deep level transient spectroscopy (DLTS) measurements in the temperature range of 85 K - 405 K. The estimated 
Schottky barrier height is 0.25 eV at 85 K and 1.06 at 405 K by I-V method, respectively. Calculations showed that the 
barrier height is 1.02 eV at room temperature by C-V method. Little variation with either temperature or frequency was 
observed, and the carrier concentration derived from these measurements confirmed the dopant concentration of ~ 
6.2×1016 cm-3. A dominant trap Ea, with activation energy of 0.92 eV is observed in n-type GaN grown by metalorganic 
chemical vapor deposition (MOCVD). The capture cross section of 1.9×10-15 cm2 is estimated based on the well-known 
logarithmic dependence of DLTS peak height with different filling pulse width for trap Ea. The trap Ea (0.92 eV), which is 
commonly observed in thin GaN layer grown by various techniques, is believed to be associated with nitrogen interstitial 
defect.
        Keywords
        Au/n-GaN Schottky diode, Temperature-dependent electrical properties, Deep level defects, DLTS measurements.
        Citation
        P. KOTESWARA RAO, V. RAJAGOPAL REDDY, Temperature-dependent electrical properties of Au  Schottky contact and deep level defects in n-type GaN, Optoelectronics and Advanced Materials - Rapid Communications, 2, 7, July 2008, pp.410-414 (2008).
        Submitted at: April 29, 2008
 
        Accepted at: July 8, 2008