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Synthesis via low pressure non-equilibrium plasma process and UV aging performance of polyacrylic films

M. I. TOTOLIN1, I. NEAMŢU1,*

Affiliation

  1. “Petru Poni” Institute of Macromolecular Chemistry, Aleea Grigore Ghica Voda No.41A, 700487 Iasi Romania

Abstract

Plasma technology offers an innovative and ecological, potentially tunable route to selectively and controllably change the physics and chemistry of the outer surface of a material by deposition of pinhole free, conformal thin films. In the paper, low pressure non-equilibrium plasma is used for the deposition of thin films from a homologous series of alkyl acrylates from methyl to butyl, on planar supports of organic nature (standard paper sample) with the protective aim. To validate the plasma polymer films applicability for paper sheet micro consolidation and protection, they are UV accelerated aged and the structural and morphological aspects are monitored by FTIR spectroscopy, atomic force microscopy, contact angle and color/gloss measurements..

Keywords

Plasma polymerization, Polyacrylic thin film deposition, UV aging, Paper conservation.

Citation

M. I. TOTOLIN, I. NEAMŢU, Synthesis via low pressure non-equilibrium plasma process and UV aging performance of polyacrylic films, Optoelectronics and Advanced Materials - Rapid Communications, 7, 3-4, March-April 2013, pp.263-271 (2013).

Submitted at: Dec. 13, 2012

Accepted at: April 11, 2013