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V. MEHTA1, S. KUMAR1,* , J. K. SHARMA1
This research work is devoted to the study of surface chemical behavior of Ni irradiated Kapton-H. The surface chemical behaviour is studied by etching process. The etching was done for three hours at each time interval of 30 mins and at two temperatures 40 degree and 50 degree Celsius. The parameters studied are thickness of polymeric sample with etching at the above mentioned two temperatures. These studies are conducted for pristine sample as well as Ni irradiated polymeric samples temperatures. The results clearly show that etch rate increases in case of Ni irradiated samples and with temperature increase. These studies are useful for industrial optoelectronic applications of Kapton-H..
Kapton-H, Ni-ion irradiation, Surface.
V. MEHTA, S. KUMAR, J. K. SHARMA, Surface chemical behavior of Ni ion irradiated Kapton-H, Optoelectronics and Advanced Materials - Rapid Communications, 3, 3, March 2009, pp.265-269 (2009).
Submitted at: Jan. 5, 2009
Accepted at: March 19, 2009
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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