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FENGHUA CHEN1, MINGANG ZHANG1,* , YUESHENG CHAI1, LIBIN YANG1
The off-stoichiometric Ni53.5Mn24.5Ga22 thin films have been prepared by magnetron-sputtering technology, The composition, morphology, and magnetic properties of the films were analyzed by energy dispersive spectroscopy (EDS), atomic force microscopy (AFM), X-ray diffraction patterns (XRD) and vibrating sample magnetometer (VSM). The results of structure measurements indicate that the as deposited films are amorphous, and show typical T-type martensitic structure after annealed due to increase of the degree of crystallization, especially at 1073 K. The films show a paramagnetism-ferromagnetism transition and the Curie temperature of film with 1.2 m is highest. And the film is magnetic anisotropy at room temperature after annealed at 1073 K..
Ni-Mn-Ga thin films, RF magnetron sputtering, Different thickness, Magnetic properties, Annealing temperature.
FENGHUA CHEN, MINGANG ZHANG, YUESHENG CHAI, LIBIN YANG, Structure and magnetic properties of Ni53.5Mn24.5Ga22 films with optimized annealing temperature and thickness, Optoelectronics and Advanced Materials - Rapid Communications, 6, 1-2, January-February 2012, pp.154-157 (2012).
Submitted at: Dec. 19, 2011
Accepted at: Feb. 20, 2012
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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