Secondary standard dosimetry laboratory at INFLPR
                
                        
                        F. SCARLAT1,
                        
                        A. SCARISOREANU1,*
                            ,
                        
                        R. MINEA1,
                        
                        E. BADITA1,
                        
                        E. SIMA1,
                        
                        M. DUMITRASCU1,
                        
                        E. STANCU1,
                        
                        C. VANCEA1
                        
                    
                    Affiliation
                    
                        
                        - National Institute for Laser, Plasma and Radiation Physics – INFLPR, Bucharest, Romania
 
                        
                    
                     
        
        Abstract
        National Institute for Laser, Plasma and Radiation Physics (INFLPR) has constructed a High Energy Secondary Standard Dosimetry Laboratory SSDL–STARDOOR – for to perform dosimetric calibrations according to SR EN ISO/IEC 17025:2005 standard. STARDOOR Lab has been accredited by the Romanian Accreditation Association – RENAR since 2011.01.10 to perform calibrations and measurements. It is outfitted with UNIDOS Secondary Standard Dosimeter from PTW (Freiburg Physikalisch-Technische Werksttaten) calibrated at the PTB - Braunschweig (German Federal Institute of Physics and Metrology). This paper presents some aspects related to the calibration, testing and characterization of dosimetric equipment and ionizing chambers in photon and electron fields following that in future they are to be extended to proton, neutron and ion fields as well..
        Keywords
        Secondary standard dosimetry laboratory, High energy, Calibration.
        Citation
        F. SCARLAT, A. SCARISOREANU, R. MINEA, E. BADITA, E. SIMA, M. DUMITRASCU, E. STANCU, C. VANCEA, Secondary standard dosimetry laboratory at INFLPR, Optoelectronics and Advanced Materials - Rapid Communications, 7, 7-8, July-August 2013, pp.618-624 (2013).
        Submitted at: Dec. 17, 2012
 
        Accepted at: July 11, 2013