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Preparation and characterization of micron copper oxide thin film based on copper through a simple method of electrodeposition

JUN YANG1, YONGQIAN WANG1,* , YINCHANG LI1, QUN MA1, JUN HAN1, HONGYUN JIN1

Affiliation

  1. Enineering Research Center of Nano-Geo Materials of Education China University of Geosciences, Wuhan 430074, China

Abstract

In this paper, we reported the preparation of micron copper oxide thin film by heating reduction of copper via a simple chemical method. The precursors of micron copper oxide were synthesized by electrodeposition. The structural, morphological and element compositional analysis of the micron copper oxide were characterized by X-ray diffraction (XRD) and scanning electron microscopy ( SEM). The results indicated that the product were cuprite structure Cu2O and tenorite structure CuO mixture with the size of about 20 μm. Photoluminescence measurement was carried out and the PL spectra of micron copper oxide thin film revealed that two strong emission at around 544 nm and 489.2 nm. In addition, the degradation experiments of methyl blue reaches to 90 %..

Keywords

CuO, Electrodeposition, Photoluminescence.

Citation

JUN YANG, YONGQIAN WANG, YINCHANG LI, QUN MA, JUN HAN, HONGYUN JIN, Preparation and characterization of micron copper oxide thin film based on copper through a simple method of electrodeposition, Optoelectronics and Advanced Materials - Rapid Communications, 8, 7-8, July-August 2014, pp.696-700 (2014).

Submitted at: March 13, 2014

Accepted at: July 10, 2014