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InN thin films deposited on flexible substrates by reactive RF-magnetron sputtering

N. C. ZOITA1,* , C. BESLEAGA1, L. BRAIC1, T. MITRAN1, C. GRIGORESCU1, L. NEDELCU2

Affiliation

  1. National Institute for Optoelectronics, P.O.Box MG-5, RO 077125, Bucharest, Romania
  2. National Institute for Materials Physics, P.O.Box MG-7, RO 077125, Bucharest, Romania

Abstract

Indium nitride is an attractive semiconductor material for optoelectronic applications, high-speed electronics and solar cells. We report successful deposition of polycrystalline InN thin films onto kapton polyimide flexible substrates by reactive RF magnetron sputtering method. The optical, structural and morphological characterization data are presented.

Keywords

Indium nitride, flexible substrate, RF-magnetron sputtering.

Citation

N. C. ZOITA, C. BESLEAGA, L. BRAIC, T. MITRAN, C. GRIGORESCU, L. NEDELCU, InN thin films deposited on flexible substrates by reactive RF-magnetron sputtering, Optoelectronics and Advanced Materials - Rapid Communications, 2, 11, November 2008, pp.719-720 (2008).

Submitted at: Sept. 30, 2008

Accepted at: Oct. 30, 2008