Abstract
Indium nitride is an attractive semiconductor material for optoelectronic applications, high-speed electronics and solar cells.
We report successful deposition of polycrystalline InN thin films onto kapton polyimide flexible substrates by reactive RF
magnetron sputtering method. The optical, structural and morphological characterization data are presented.
Keywords
Indium nitride, flexible substrate, RF-magnetron sputtering.
Citation
N. C. ZOITA, C. BESLEAGA, L. BRAIC, T. MITRAN, C. GRIGORESCU, L. NEDELCU, InN thin films deposited on flexible substrates by reactive RF-magnetron sputtering, Optoelectronics and Advanced Materials - Rapid Communications, 2, 11, November 2008, pp.719-720 (2008).
Submitted at: Sept. 30, 2008
Accepted at: Oct. 30, 2008