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B. RAJESH KUMAR1,2,* , T. SUBBA RAO2
Zinc Aluminum Oxide (ZAO) thin films were deposited on glass substrates by DC reactive magnetron sputtering technique. Studies on structural, morphological, electrical and optical properties with different thickness of films are discussed in detail. XRD patterns exhibits ZAO thin films had a diffraction peak corresponding to (0 0 2) preferred orientation with c-axis perpendicular to the substrate surface. The optical band gap of nanostructured ZAO thin films increases with increase of film thickness from 3.41 to 3.51 eV. The carrier concentration of ZAO thin films are in the range of 3.08 x 1020 cm-3 – 8.12 x 1020 cm-3..
DC magnetron reactive sputtering, ZAO films, Electrical properties, Optical properties.
B. RAJESH KUMAR, T. SUBBA RAO, Influence of nanoscale structural features on the physical properties of DC reactive magnetron sputtered Zinc Aluminum Oxide (ZAO) thin films for photovoltaic applications, Optoelectronics and Advanced Materials - Rapid Communications, 6, 11-12, November-December 2012, pp.1092-1096 (2012).
Submitted at: April 12, 2012
Accepted at: Oct. 30, 2012
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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