Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our site without changing the browser settings you grant us permission to store that information on your device.
Y. K. BU1, Z. LIU1, L. J. CHEN1, Z. P. CAI1, N. CHEN1,*
In this work we report a novel remote plasma deposition technology for high-rate DC reactive sputtering deposition of low loss Ta2O5 films. Deposition rate and optical properties were mainly investigated with process conditions change. This technique is based on generating an intensive plasma remotely from the target and magnetically steering plasma to the target to realize sputtering deposition. It overcomes inherent limitations such as racetrack formation on target and low rate deposition in conventional sputtering technology and realizes fully uniform erosion over the target. Dense Ta2O5 thin films with a high deposition rate 0.53nm/s, excellent optical properties are obtained.
Plasma source, Sputtering deposition, Ta2O5 thin films.
Y. K. BU, Z. LIU, L. J. CHEN, Z. P. CAI, N. CHEN, High rate and low loss Ta2O5 thin films deposited by novel remote plasma reactive sputtering, Optoelectronics and Advanced Materials - Rapid Communications, 4, 8, August 2010, pp.1154-1157 (2010).
Submitted at: July 1, 2010
Accepted at: Aug. 12, 2010
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
Active accounts were imported to the new platform and assigned a random password by default. In order to access your account you need to access the login page and go through the Lost Password dialog (involves the system sending you an email with instructions) in order to reset your password. This step is necessary as passwords are kept in hashed form and the new platform uses modern hashing algorithms incompatible with the previous ones.