Abstract
A height displacement sensing system based on varied period plane diffraction grating fabricated by electron beam
lithography method was proposed and demonstrated experimentally. The system is comprised of broadband light source,
Y-type twin-core fiber, collimator lens, aluminium coating reflector, grating and optical stage. In the system, the designed
grating line density was changed from 950 to 590 L/mm, and the grating size was 80 mm × 10 mm. When the height of optical
stage changes, the light spot moved to different grating positions, and the diffracted light wavelength changed simultaneously.
When the height displacement changed from 0 to 25 mm, the diffracted light wavelength changed from 1108 nm to 1328.62
nm with sensitivity of 9.39 nm/mm, and linearity of 0.996. Thus the height displacement can be deduced according to the
wavelength of the diffracted light. The systematic error, gross error and uncertainty evaluation of the proposed height
displacement sensing system were studied respectively. The error analysis of the system was executed which showed that
the uncertainty the system is 0.110 nm.
Keywords
Height displacement sensing, Varied period plane grating, Electron beam lithography, Uncertainty evaluation.
Citation
WANG SHAN, ZHANG ZILI, MENG FANCHANG, WANG PENG, Height displacement sensing system based on varied period plane diffraction grating, Optoelectronics and Advanced Materials - Rapid Communications, 15, 11-12, November-December 2021, pp.515-520 (2021).
Submitted at: June 1, 2021
Accepted at: Nov. 24, 2021