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Growth, microstructure and electrochromic properties of activated reactive evaporated WO3 thin films on flexible substrates

K. HARI KRISHNA1, O. M. HUSSAIN1,* , C. GUILLEN2

Affiliation

  1. Thin Film Laboratory, Department of Physics, Sri Venkateswara University, Tirupati – 517 502, India
  2. Department of Energy, CIEMAT, Avda. Complutense 22, Madrid 28040, Spain

Abstract

The tungsten trioxide (WO3) thin films were deposited onto flexible ITO coated Kapton substrates using plasma assisted activated reactive evaporation technique. The film depositions were carried out at an optimized glow power and oxygen partial pressures of 8 W and 1 X 10-3 Torr respectively. The WO3 thin films deposited at a substrate temperature of 473 K were found to be composed of uniformly distributed nano grains with a triclinic structure. These nano crystalline WO3 thin films showed 73% optical transmittance in the visible region with an optical band gap of 3.34 eV. The film exhibited an optical modulation of 53 % upon lithium insertion and estimated coloration efficiency at a wavelength 550 nm is about 45 cm2 /C.

Keywords

WO3 thin films, Activated reactive evaporation, Microstructure, Electrochromic properties, Nanocrystalline.

Citation

K. HARI KRISHNA, O. M. HUSSAIN, C. GUILLEN, Growth, microstructure and electrochromic properties of activated reactive evaporated WO3 thin films on flexible substrates, Optoelectronics and Advanced Materials - Rapid Communications, 2, 4, April 2008, pp.242-246 (2008).

Submitted at: March 23, 2008

Accepted at: April 3, 2008