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Formation of thin silicon films on soda-lime silica glass surface by magnetron sputtering deposition

I. M. KLIMOVICH1, A. L. STEPANOV2,*

Affiliation

  1. Belarusian State University, 220030, Minsk, Belarus
  2. Zavoisky Physical-Technical Institute, FRC Kazan Scientific Center of RAS, 420029, Kazan, Russia

Abstract

Magnetron high-power impulse sputtering was used for deposition of H2-free amorphous thin Si films in Ar atmosphere on a flat surface of soda-lime silicate glass at different values of the substrate temperature and bias potential to glass. The surface morphology of the deposited films and their transverse structure were studied by scanning electron and atomicforce microscopy. For various deposition regimes, the appearance on the film surface spherical craters with diameters of several hundred nanometers and Si nanowires towering over a film were observed. The degree of transparency of the films in the visible spectral range was also analyzed. This work demonstrates that magnetron sputtering offers a good potential for depositing the transparent films for silicon-based photonics.

Keywords

Magnetron sputtering, Thin silicon films nanoparticles, Microscopy.

Citation

I. M. KLIMOVICH, A. L. STEPANOV, Formation of thin silicon films on soda-lime silica glass surface by magnetron sputtering deposition, Optoelectronics and Advanced Materials - Rapid Communications, 17, 3-4, March-April 2023, pp.165-169 (2023).

Submitted at: Feb. 6, 2022

Accepted at: April 7, 2023