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Fault mechanisms in a CMOS N-diffusion photodiode

A. DRAGULINESCU1,* , L. LIZARRAGA2, S. MIR2, G. SICARD2

Affiliation

  1. “Politehnica” University of Bucharest, Optoelectronics Research Center, Blvd Iuliu Maniu 1-3 Spl. Independenţei 313, sector 6, RO-060032, Bucharest, Romania
  2. TIMA Laboratory, 46 Félix Viallet, 38031 Grenoble, France

Abstract

Very little literature is today available describing defects and failure mechanisms in a photodiode. The study of defects is very important, as they can significantly reduce the performances of the photodiode. The reason for the lack of data in this field is the fact that the defects, that increase the dark current and reduce the photogenerated current, are not understood well enough to enable the development of a general model. In this paper we performed an analysis of the defects and failure mechanisms in the photodiode, pointing out their characteristics and their influence on the parameters of the photodiode (photogenerated current, dark current).

Keywords

CMOS photodiode, Defect and failure mechanisms, T-CAD tools.

Citation

A. DRAGULINESCU, L. LIZARRAGA, S. MIR, G. SICARD, Fault mechanisms in a CMOS N-diffusion photodiode, Optoelectronics and Advanced Materials - Rapid Communications, 1, 4, April 2007, pp.166-170 (2007).

Submitted at: Feb. 1, 2007

Accepted at: March 14, 2007