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BO WANG1,* , LI CHEN1, LIANG LEI1, JINYUN ZHOU1
Fused-silica is an excellent optical material for its high optical quality. Gratings etched in fused silica can be widely used in a variety of optical systems. By lithography and inductively coupled plasma etching technology, fused-silica gratings can be fabricated for mass production with low cost. In order to achieve fast etching rate, gas of SF 6 was used to generate main etching ions. A nd optimized dry etching conditions were given, including gas flow rate and two radio frequency sources Experimental results show that the etc hing rate can reach 1.44 m 10 min under optimized etching conditions of SF 6 without polymer deposition..
Grating, Inductively coupled plasma, Fused silica, SF 6.
BO WANG, LI CHEN, LIANG LEI, JINYUN ZHOU, Fast etching of fused silica gratings with inductively coupled plasma by SF 6, Optoelectronics and Advanced Materials - Rapid Communications, 7, 11-12, November-December 2013, pp.1021-1023 (2013).
Submitted at: Nov. 6, 2012
Accepted at: Nov. 7, 2013
Optoelectronics and Advanced Materials - Rapid Communications
(2022): 0.5 - 2022 Journal Citation Reports (Clarivate Analytics, 2023)
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