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Far – field radiation characteristics in a dielectric environment

C. MERTZANIDIS1,* , L. MAGAFAS2

Affiliation

  1. TEI of Kavala, Depart. of Industrial Informatics, 65404 Kavala, Greece
  2. TEI of Kavala, Depart. of Electrical Engineering, 65404 Kavala, Greece

Abstract

The far - field characteristics of line sources lying between the slabs of a multi - dielectric substrate configuration are presented. Such a configuration is usual in the technology of microstrips as well as in remote sensing. The electric field is expressed in the form of a Fourier integral of the potential V(y,h), which is given by the solution of the 2-D wave equation. The unknown coefficients of the solution are found from the boundary conditions of the electric and magnetic fields at the interfaces of the substrates. A set of numerical results for one to many substrates media give interesting radiation patterns. The main conclusion is that the patterns from a line source are similar to that given in free space by a complex array of sources. Symmetric or non - symmetric configurations give patterns with the corresponding characteristics. The ray optical techniques fail for more than three substrates, due to multi - reflection and refraction, while our procedure can be applied for any set of lossless or lossy substrates.

Keywords

Radiation patterns, Dielectrics, Signal processing, Remote sensing, Microstrip antennas.

Citation

C. MERTZANIDIS, L. MAGAFAS, Far – field radiation characteristics in a dielectric environment, Optoelectronics and Advanced Materials - Rapid Communications, 1, 9, September 2007, pp.457-466 (2007).

Submitted at: Aug. 7, 2007

Accepted at: Aug. 15, 2007