Abstract
Indium telluride thin films of higher thickness were prepared by thermal evaporation technique and the as-deposited films
were annealed in a vacuum at different temperature. The influence on structure and electrical properties were characterized
by X-ray diffraction (XRD) and resistivity measurements. From the structural analysis, the as-deposited In2Te3 films which
were annealed at 423K and 573K respectively, reveals that the films are polycrystalline in nature. The structural parameters
such as crystalline size, strain and dislocation density were determined using X-ray diffractogram of the film. Resistivity
measurement by four probe method shows semi conducting nature.
Keywords
Indium telluride, Thermal evaporation, XRD, Resistivity measurement, Four probe.
Citation
P. BHARATHI, A. SUBBARAYAN, Effect of annealing on the structural and electrical properties of thermally evaporated In2Te3 thin films, Optoelectronics and Advanced Materials - Rapid Communications, 3, 4, April 2009, pp.334-337 (2009).
Submitted at: March 5, 2009
Accepted at: April 23, 2009