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NINGNING LUO1,2,* , YIQING GAO2, ZHIMIN ZHANG2, MENGCHAO XIAO2
We present a new lithography technique, namely digital-division-mask technique by binary coding, which is developed for forming microstructure relief and improving the edge lithography resolution. The microstructure relief is firstly transformed into multiple binary patterns and then they are superposed on a photoresist-coated silicon substrate in sequence. The mechanism for improvement of image edge sharpness by using division method is disclosed, and the division principle is described. As a result of the digital-division-mask lithography, positive photoresist patterns of zigzag gratings with a period of 16m and 64m are fabricated..
Digital-division-mask technique, Binary coding, Edge lithography resolution, Edge sharpness.
NINGNING LUO, YIQING GAO, ZHIMIN ZHANG, MENGCHAO XIAO, Digital-division-mask technique by binary coding for microstructure fabrication, Optoelectronics and Advanced Materials - Rapid Communications, 6, 1-2, January-February 2012, pp.313-318 (2012).
Submitted at: Nov. 29, 2011
Accepted at: Feb. 20, 2012
Optoelectronics and Advanced Materials - Rapid Communications
(2023): 0.5 - 2023 Journal Citation Reports (Clarivate Analytics, 2024)
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