OAM-RC

Abstract

Cuprous oxide films were prepared by electrodeposition using copper dichloride and sodium citrate as raw materials on the conductive SnO2 glass substrates. The effects of pH value and deposition temperature on electrochemical performance and phase formation of cuprous oxide thin films were investigated. The electrochemical performance of the bath was tested by the electrochemical workstation. The phases of product samples were analyzed by X-ray diffraction (XRD) and the morphology of the product films were observed using scanning electron microscope (SEM). Experimental results show that, when pH= 1 Hydrogen evolution phenomena were quite serious with more intense ionic discharge, while the more stable reactions with pH= 2 and small polarizability are conducive to formation of the cuprous oxide film. When pH=1 and 2, only XRD peaks for Cu2O as a product phase can be seen except those of SnO2 conducting layer on the glass substrates. The higher temperature promotes crystallization of the cuprous oxide film while the obvious shedding phenomena occurred at the deposition temperature higher than 60 oC. The morphology of the product films varied greatly with the deposition temperature rising. Irregular shape, feathery shape and cubic crystal particles can be occurred in the product films obtained at 20 oC, 40 oC and 60 oC respectively. Well crystallized, dense and uniform cuprous oxide film can be prepared when pH= 2 at 60 ºC.

Keywords

Cuprous oxide, Electrodeposition, Phase formation, Morphology.

Citation

KEGAO LIU, LUDAN SHI, YONG XU, ZHIGANG WANG, XIAOJUAN LIN, Cuprous oxide thin films electrodeposited under conditions of different temperatures and pH values, Optoelectronics and Advanced Materials - Rapid Communications, 10, 3-4, March-April 2016, pp.249-252 (2016).

Submitted at: Oct. 26, 2014

Accepted at: April 5, 2016