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Characteristics of undoped porous GaN prepared by UV assisted electrochemical etching

A. MAHMOOD1,2,* , Z. HASSAN1, F. K. YAM1, L. S. CHUAH3

Affiliation

  1. Nano-Optoelectronics Research and Technology Laboratory School of Physics, Universiti Sains Malaysia, 11800 Minden, Penang, Malaysia
  2. Department of Applied Sciences, Universiti Teknologi MARA, 13500 Permatang Pauh, Penang, Malaysia
  3. School of Distance Education Universiti Sains Malaysia, 11800 Minden, Penang, Malaysia

Abstract

The structural and optical characteristics of porous GaN prepared by UV assisted electrochemical etching under different etching durations were reported. SEM micrographs indicated that the average pore size for samples was around 0.33 to 0.43 μm. The AFM measurements revealed that the surface roughness increased with etching duration. PL measurements revealed that the near band edge peak of all the porous samples were red-shifted; moreover, the PL intensity enhancement was observed in the porous samples. Raman spectra exhibited the shift of E2 (high) to the lower frequency for porous samples.

Keywords

Porous GaN, Photoelectrochemical (PEC) anodic etching, SEM, Photoluminescence, Raman scattering.

Citation

A. MAHMOOD, Z. HASSAN, F. K. YAM, L. S. CHUAH, Characteristics of undoped porous GaN prepared by UV assisted electrochemical etching, Optoelectronics and Advanced Materials - Rapid Communications, 4, 9, September 2010, pp.1316-1320 (2010).

Submitted at: Aug. 5, 2010

Accepted at: Sept. 15, 2010