"

Cookies ussage consent

Our site saves small pieces of text information (cookies) on your device in order to deliver better content and for statistical purposes. You can disable the usage of cookies by changing the settings of your browser. By browsing our site without changing the browser settings you grant us permission to store that information on your device.

Al:ZnO films deposited on flexible transparent polyimide substrate by magnetron sputtering at different substrate temperatures

WEIMIN LI1, HUIYING HAO1,*

Affiliation

  1. S chool of S cience , China University of Geosciences, Beijing, China

Abstract

Al:ZnO films were deposited on flex ible transparent polyimide(PI) substrate by magnetron sputtering at different temperatures(from room temperature to 250 ℃) using ceramic ZnO:Al (3 wt.% Al2O3 ) target without any optimized process. The PI has a high glass transition temperature more than 250 and high transmittance in the visible spectrum better than 92%.The structural, optical and electrical properties of t he film were investigated. The largest grain size was about 26.2 nm with a perfect preferential orientation of (002) planes. The lowest resistivity of AZO films deposited at 150 was 2.51×10 3 Ω·cm and average transmittance in the visible spectrum was 74.3%..

Keywords

Flexible transparent substrate, Polyimide, AZO film, Magnetron sputtering, Substrate temperature.

Citation

WEIMIN LI, HUIYING HAO, Al:ZnO films deposited on flexible transparent polyimide substrate by magnetron sputtering at different substrate temperatures, Optoelectronics and Advanced Materials - Rapid Communications, 6, 1-2, January-February 2012, pp.117-120 (2012).

Submitted at: Nov. 24, 2011

Accepted at: Feb. 20, 2012